ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,817, issued on Nov. 3, was assigned to THE AEROSPACE Corp. (El Segundo, Calif.). "Patterned dark mirror coatings for multi-functional optics... Read More
ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,818, issued on Nov. 3, was assigned to ASML NETHERLANDS (Veldhoven, Netherlands). "Interface definition for lithographic apparatus" was inve... Read More
ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,820, issued on Nov. 3, was assigned to LG CHEM Ltd. (Seoul, South Korea). "Stripper composition for removing photoresist and stripping metho... Read More
ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,822, issued on Nov. 3, was assigned to ASML NETHERLANDS (Veldhoven, Netherlands). "Method for determining mask pattern and training machine ... Read More
ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,824, issued on Nov. 3, was assigned to Carl Zeiss SMT GmbH (Oberkochen, Germany). "Method for simulating illumination and imaging properties... Read More
ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,825, issued on Nov. 3, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands). "Diffraction-based pupil determination for optimizati... Read More
ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,826, issued on Nov. 3, was assigned to Carl Zeiss SMT GmbH (Oberkochen, Germany). "Measurement apparatus, method for operating a mask-metrol... Read More
ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,827, issued on Nov. 3, was assigned to ASML NETHERLANDS (Veldhoven, Netherlands). "Lithographic method" was invented by Pioter Nikolski (Vel... Read More
ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,828, issued on Nov. 3, was assigned to KLA Corp. (Milpitas, Calif.). "System and method for target centering detection in overlay metrology"... Read More
ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,829, issued on Nov. 3, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands). "Overlay metrology based on template matching with ad... Read More